Wacom MOCVD system has accomplished an epoch-making mass production mechanism of FeRAM-LSI by continous research on film deposition of ferroelectrics such as PZT(Lead Zirconate Titanate) , SBT(Strontium Bismuth Tantalete), which has been difficult to do by the usual CVD mechanism.

Wacom MOCVD system is sure to make a marvelous development in production of the next generation FeRAM-LSI. Also, this system is applicable to a far broader field including FeRAM because this system is able to perform film deposition of metal oxides of various compositions as well as that of electrode metal and PZT/SBT.