WACOM R&DSpace
English
HOME information company mocvd deposition recruiting access inquiry
HOME > MOCVD > WMCS-2200
 
 
Mass production of FeRAM-LSI has been realized by using our newly produced system developed by industry-university co-operation.
    Strong Point 1
 
Strong Point 2
 
Specifications
 
Material developed by Electronic Material Society
 
 
 Patents
 
 
 For the first time in the world, WACOM Electric Co., Ltd. (currently WACOM Research and Development, the president being Masaki Kusuhara) has accomplished the MOCVD system intended for ferroelectrics thin film deposition for mass production of FeRAM. (Distributor is M. Watanabe & Co., Ltd.)
 For realization of this completely new MOCVD system, WACOM R and D and Dr. Toda of YamagataUniversity, under assistance of M. Watanabe & Co., Lted., worked together to develop a unique mechanism which was not found in the usual CVD system.
 Details of this new mechanism were reported at the domestic and foreign Applied Physics Societies and ISIF* to be highly evaluated.

ISIF - International Symposium on Integrated Ferroelectrics

 
 A remarkable property of this system is the high quality liquid supplying system and evaporation system (both internationally patented) developed by co-operation of M. W., WACOM Electric Co., Ltd. (currently WACOM Research and Development), and Dr. Masayuki Toda, the professor of Yamagata University, the department of engineering. Adoption of the high quality liquid supplying system resulted in a minimized dead space and automatic cleaning system. By this evaporation system, with its particular structure, the material liquid is efficiently evaporated, which prevents a nozzle from clogging up and enables continuous operation.
 
 Strong Point 1  Strong Point 2  Specifications    
 
 Material developed by Electronic Material Society  Patents  
 
 
Copyright © 2006-2009 WACOM R&D Corporation All Rights Reserved.